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Flame and Gas monitoring is required for the protection of personnel and equipment at Semiconductor Facilities. There are a variety of combustible hazards associated with the industry.
Alcohol bath drying, a process in wafer manufacturing, involves flammable alcohols and gases. The wafers are washed and then
dipped in an alcohol bath to remove any moisture. Hydrogen gas (H2) is also used in this process as a scavenger to remove
oxygen and as carrier to remove dopant gases. Other processes, such as plating operations, crystal growing, diffusion,
oxidation, ion implantation, metallization, as well as etching and cleaning involve various toxic and flammable solvents -
especially in the evaporation processes. For this reason, combustible gas detectors should be situated at a facility's
ventilation and air-intakes ducts.
The presence of pyrophoric materials such as inorganic hydrides, silane, diborane, dichlorosilane, metal alkyls, and organometallics require a second line of defense in the form of flame detection. Many of these chemicals and gases ignite spontaneously when a leak occurs, even in small concentrations. As a result, flame detectors should be used to protect specific areas where these materials, and any combustible materials, are present.
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| Hazard |
Source |
Safety Solution |
| Isopropyl alcohol (Combustible) |
Alcohol dryers |
Millennium II,
Millennium II BASIC,
MLP-SC1100 (Catalytic Bead),
MLP-SIR100 (Infrared) |
| Hydrogen Gas (H2) (Combustible) |
Wafer manufacturing |
Millennium II,
Millennium II BASIC,
MLP-SC1100 (Catalytic Bead) |
| Chlorine (Cl2) (toxic) |
Gas cabinets |
Millennium II,
Millennium II BASIC,
MLP-ST1500 (Electrochemical),
Gas Shield Junior or Senior |
| Fire |
Combustible gases and pyrophoric materials |
Phoenix IR3 (multi-spectral infrared) detector,
Smart UV/IR detector,
Smart UVS detector
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